ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,712,163, issued on Aug. 18, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea).
"Substrate treating apparatus and substrate treating method" was invented by Chung Woo Lee (Gyeonggi-do, South Korea), Chang Jun Park (Gyeonggi-do, South Korea) and Tae Dong Park (Gyeonggi-do, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber having an entrance for taking in and taking out a substrate at a side wall; a support unit provided inside of the chamber and supporting the substrate; an imaging unit for imaging a substrate being tak...