US Patent Issued to SEMES on Aug. 11 for "Substrate processing apparatus and process control method thereof" (South Korean Inventor)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,707,925, issued on Aug. 11, was assigned to SEMES Co. LTD. (Cheonan-si, South Korea).

"Substrate processing apparatus and process control method thereof" was invented by Young Hwan Yang (Yongin-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A process control method of a substrate processing apparatus includes monitoring a process status of each process chamber of a plurality of process chambers, determining a shift-to-idle process chamber to be shifted from a process state to an idle state among the plurality of process chambers, storing a first to-be-processed substrate in a storage, associated with the shift-to-idle process chamber, am...