ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,707,913, issued on Aug. 11, was assigned to SEMES Co. Ltd. (Cheonan-si, South Korea).
"Apparatus and method for processing substrate using supercritical fluid" was invented by Hae Won Choi (Daejeon, South Korea), Thomas Jongwan Kwon (Gyeonggi-do, South Korea) and Chengyeh Hsu (Busan, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing method using a supercritical fluid is provided that can deposit a conformal film in a trench with a high aspect ratio and allows complete filling without voids. The substrate processing method comprises performing a supercritical process by repeating a first step, a first vent step, a second s...