ALEXANDRIA, Va., April 7 -- United States Patent no. 12,595,567, issued on April 7, was assigned to SEMES Co. LTD. (Chungcheongnam-do, South Korea).

"Substrate treating apparatus and substrate treating method" was invented by Shin Hwa Kang (Gyeonggi-do, South Korea), Seung Un Oh (Chungcheongnam-do, South Korea), Young Ho Park (Incheon, South Korea), Sang Hyeon Ryu (Gyeonggi-do, South Korea) and Kwang Sup Kim (Chungcheongnam-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a method for treating a substrate, on which a plurality of reference marks and a pattern are formed. The method includes a process preparing operation, a location information acquiring operation of acquiring infor...