ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,973, issued on April 14, was assigned to Semes Co. LTD. (Cheonan-si, South Korea).
"System for supplying photoresist and method for managing photoresist" was invented by Hae Kyung Kim (Cheonan-si, South Korea), Dae Sung Kim (Cheonan-si, South Korea) and Woo Sin Jung (Cheonan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a system for supplying a photoresist. In an embodiment, a system for supplying a photoresist includes a pressure adjustment container provided to a supply line connected from a chemical liquid bottle to a first tank, and the pressure adjustment container includes a housing having a space formed therein, ...