ALEXANDRIA, Va., June 9 -- United States Patent no. 12,648,697, issued on June 9, was assigned to SEIKO EPSON Corp. (Tokyo).
"Detection apparatus and measuring apparatus" was invented by Tetsuya Yamamoto (Suwa, Japan) and Takefumi Fukagawa (Suwa-gun, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A detection apparatus includes a semiconductor substrate, a first photoelectric conversion unit formed at the semiconductor substrate, a first light emitting layer formed by being stacked at the semiconductor substrate, and a first filter layer formed by being stacked at the first photoelectric conversion unit."
The patent was filed on Feb. 24, 2023, under Application No. 18/113,741.
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