US Patent Issued to SEIKO EPSON on April 7 for "Method of manufacturing liquid discharging head, method of manufacturing nozzle substrate, and liquid discharging head" (Japanese Inventors)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,594,763, issued on April 7, was assigned to SEIKO EPSON Corp. (Japan).

"Method of manufacturing liquid discharging head, method of manufacturing nozzle substrate, and liquid discharging head" was invented by Shinichi Yotsuya (Chino, Japan), Masahiro Fujii (Shiojiri, Japan) and Koji Kitahara (Ina, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of manufacturing a liquid discharging head includes a pressure chamber substrate that includes a pressure chamber and a nozzle substrate that includes a nozzle communicating with the pressure chamber and is formed of a semiconductor substrate, the method including a first step in which, in a state wh...