ALEXANDRIA, Va., April 21 -- United States Patent no. 12,609,288, issued on April 21, was assigned to Seagate Technology LLC (Fremont, Calif.).

"Sputtering targets, and related apparatuses and methods" was invented by Florin Zavaliche (San Ramon, Calif.), Robin Davies (Livermore, Calif.), Thomas Larson Greenberg (Berkeley, Calif.) and Chun Wai Joseph Tong (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to target plates for sputtering a material to form a layer of material on a substrate. In some embodiments, a target plate is made up of two or more discrete sections and/or has at least one recess to help reduce or avoid hotspots created by a rotating plasma rin...