ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,777,874, issued on Oct. 27, was assigned to SCREEN HOLDINGS Co. LTD. (Japan).

"Substrate processing apparatus" was invented by Shuhei Nemoto (Kyoto, Japan), Kazuhiro Shoji (Kyoto, Japan), Ryotaro Shinohara (Kyoto, Japan) and Itsuki Kajino (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In processing a peripheral edge part of a substrate by a processing liquid, upward scattered liquid droplets may be produced. Accordingly, in the invention, the processing liquid is caused to land on the peripheral edge part of the substrate from a discharge port while the discharge port is positioned to a bevel processing position lower than an eaves part of...