US Patent Issued to SCREEN Holdings on Oct. 20 for "Substrate processing apparatus and substrate processing method" (Japanese Inventor)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,766,566, issued on Oct. 20, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).

"Substrate processing apparatus and substrate processing method" was invented by Tadashi Maegawa (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A control unit supplies a discharge liquid used in a second half of washing process by a washing process unit to a washing process unit, and supplies the discharge liquid used in a second half of the washing process by the washing process unit to the washing process unit. Since the discharge liquid used in the washing process unit is reused in the washing process unit and the discharge liquid used in the washing pr...