ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,787,710, issued on Nov. 3, was assigned to SCREEN HOLDINGS Co. LTD. (Japan).
"Substrate processing device and substrate processing method" was invented by Kazuki Nakamura (Kyoto, Japan), Yoshifumi Okada (Kyoto, Japan) and Nobuaki Okita (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing device includes a plurality of cleaning devices and a main robot. The main robot is configured to carry a substrate into and carrying the substrate out from each substrate cleaning device. The substrate cleaning device includes a processing chamber. In the processing chamber, a brush cleaner that brings a brush into contact with a lower sur...