US Patent Issued to SCREEN Holdings on May 26 for "Substrate processing apparatus and substrate processing method" (Japanese Inventors)

ALEXANDRIA, Va., May 26 -- United States Patent no. 12,636,685, issued on May 26, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).

"Substrate processing apparatus and substrate processing method" was invented by Toru Endo (Kyoto, Japan), Takuji Kato (Kyoto, Japan), Rikuta Aoki (Kyoto, Japan), Yuta Yamanouchi (Kyoto, Japan) and Yutaka Ikegami (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A rinse liquid remaining on a substrate after a rinsing process is replaced with a replacement liquid having a surface tension lower than that of the rinse liquid. During this replacement, a nozzle device is arranged at a nozzle upper position higher than a processing cup. The nozzle device is moved fro...