ALEXANDRIA, Va., May 19 -- United States Patent no. 12,629,716, issued on May 19, was assigned to SCREEN HOLDINGS Co. LTD. (Japan).

"Substrate processing apparatus and substrate processing method" was invented by Masafumi Suzuki (Kyoto, Japan) and Shigehiro Goto (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a nozzle block in which a slit-like discharge port is formed and a controller. The controller controls an X-direction driver and a Z-direction driver, so that a nozzle block is moved on a substrate with a gap between the nozzle block and the substrate filled with a processing liquid. At this time, the processing liquid is applied onto the substrate....