ALEXANDRIA, Va., March 31 -- United States Patent no. 12,589,403, issued on March 31, was assigned to SCREEN HOLDINGS Co. LTD. (Japan).

"Substrate processing apparatus and substrate processing method" was invented by Shuhei Nemoto (Kyoto, Japan), Kazuhiro Shoji (Kyoto, Japan), Ryotaro Shinohara (Kyoto, Japan), Akira Ito (Kyoto, Japan) and Itsuki Kajino (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention includes a gas supplier for discharging a gas into a space sandwiched between a substrate and a shielding plate by supplying the gas to a gas discharge nozzle provided in the shielding plate to form a flow of the gas from a central part toward a radially outer side of the substrate. Thi...