ALEXANDRIA, Va., March 17 -- United States Patent no. 12,581,911, issued on March 17, was assigned to SCREEN Holdings Co. Ltd. (Japan).
"Substrate processing apparatus" was invented by Kazuhiko Nakazawa (Kyoto, Japan), Toshihito Morioka (Kyoto, Japan), Hiromichi Kaba (Kyoto, Japan) and Takashi Ota (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "In a substrate holder, a gas supply part sends out a gas to the space between the lower surface of a substrate and a base surface of a base part to form a radially outward airflow. A division plate is arranged radially outward of the outer peripheral edge of the substrate on the base surface of the base part to surround the substrate. The inner peripheral...