ALEXANDRIA, Va., July 16 -- United States Patent no. 12,667,867, issued on June 30, was assigned to SCREEN HOLDINGS Co. LTD. (Japan).
"Processing chamber cleaning method, cleaning attachment and substrate processing system" was invented by Noritake Sumi (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "This invention relates a processing chamber cleaning method for a supercritical processing apparatus for accommodating a supporting member supporting a substrate into a processing space of a processing chamber and processing the substrate by a processing fluid in a supercritical state in the processing space. The processing chamber cleaning method includes supporting a flat dish-like container stori...