US Patent Issued to SCREEN Holdings on June 23 for "Substrate processing device and substrate processing method" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,661,802, issued on June 23, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).

"Substrate processing device and substrate processing method" was invented by Nobuaki Okita (Kyoto, Japan), Kazuki Nakamura (Kyoto, Japan) and Yoshifumi Okada (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate cleaning device includes a chamber, a first processing part and a second processing part. The chamber forms a processing space including a first processing position and a second processing position. The first processing part performs a first process on a substrate disposed at the first processing position in the chamber. The second processing...