ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,416, issued on July 21, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).
"Substrate processing method" was invented by Tomohiro Takahashi (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "In substrate processing using the batch processing unit and the single substrate processing unit, the entire substrate processing is efficiently advanced. A substrate processing method includes: a process of calculating a required period of time that is a period of time taken for the substrates to complete the substrate processing in the single substrate processing unit according to a standby number that is a number of the substrates after being ...