US Patent Issued to SCREEN Holdings on Aug. 25 for "Substrate treatment device and substrate treatment method" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,721,085, issued on Aug. 25, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).

"Substrate treatment device and substrate treatment method" was invented by Masaki Inaba (Kyoto, Japan), Naoko Arima (Kyoto, Japan) and Kei Suzuki (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate treatment apparatus includes: a substrate treatment unit that treats a substrate with a treatment liquid containing ozone dissolved therein; a recovery tank in which the treatment liquid discharged from the substrate treatment unit is recovered; a recovery pipe that connects the substrate treatment unit to the recovery tank; a heating member that heats t...