US Patent Issued to SCREEN Holdings on April 21 for "Substrate processing system and substrate processing method" (Japanese Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,770, issued on April 21, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).

"Substrate processing system and substrate processing method" was invented by Hiroaki Ishii (Kyoto, Japan), Ryo Muramoto (Kyoto, Japan), Junichi Ishii (Kyoto, Japan) and Takayuki Nishida (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing system includes a protective film forming liquid supplying unit which supplies a protective film forming liquid to one surface of a substrate, a protective film forming unit which solidifies or hardens the protective film forming liquid and forms a protective film on the one surface of the substrate, a...