US Patent Issued to SAP on March 31 for "Predicting purge effects in hierarchical data environments" (Chinese Inventors)

ALEXANDRIA, Va., March 31 -- United States Patent no. 12,591,565, issued on March 31, was assigned to SAP SE (Walldorf, Germany).

"Predicting purge effects in hierarchical data environments" was invented by Haipeng Wu (Shanghai), Fen Li (Shanghai), Lei Wang (Shanghai), Feng Zhang (Shanghai), Lai Wei (Shanghai) and Yunfeng Jiang (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods described herein relate to the prediction of effects of data purging on data sources that are related through hierarchical data relationships. A purge request comprises a set of purge parameters that identify a data source and define one or more purge criteria for purging of data items of the data source. A p...