US Patent Issued to SAMYANG on May 12 for "Naphthalimide sulfonate derivative, and photoacid generator and photoresist composition which comprise same" (South Korean Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,007, issued on May 12, was assigned to SAMYANG Corp. (Seoul, South Korea).

"Naphthalimide sulfonate derivative, and photoacid generator and photoresist composition which comprise same" was invented by Chun Rim Oh (Seoul, South Korea), Dae Hyuk Choi (Seoul, South Korea), Min Jung Kim (Daejeon, South Korea), Deuk Rak Lee (Daejeon, South Korea), Won Jung Lee (Daejeon, South Korea), Yu Na Choi (Daejeon, South Korea) and Ji Eun Choi (Seongnam-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a naphthalimide sulfonate derivative, and a photoacid generator and a photoresist composition which comprise same, and, ...