US Patent Issued to SAMSUNG SDI on Oct. 6 for "Hardmask composition, hardmask layer, and pattern forming method" (South Korean Inventor)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,481, issued on Oct. 6, was assigned to SAMSUNG SDI Co. LTD. (Yongin-si, South Korea).

"Hardmask composition, hardmask layer, and pattern forming method" was invented by Jaebum Lim (Yongin-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a hardmask composition including a compound represented by Chemical Formula 1 and a solvent, a hardmask layer including a cured product of the hardmask composition, and a pattern forming method using the hardmask composition.In Chemical Formula 1, the definitions of A, R1 to R5, and n are as described in the specification."

The patent was filed on June 3, 2020, under App...