US Patent Issued to Samsung SDI on Oct. 27 for "Hardmask composition, hardmask layer, and method of forming patterns" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,212, issued on Oct. 27, was assigned to Samsung SDI Co. Ltd. (Yongin-si, South Korea).

"Hardmask composition, hardmask layer, and method of forming patterns" was invented by Yoona Kim (Suwon-si, South Korea), Hyejeong Kim (Suwon-si, South Korea) and Sunyoung Yang (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A hardmask composition, a hardmask layer manufactured from the hardmask composition, and a method of forming patterns from the hardmask composition, the composition includes a polymer including a structural unit represented by Chemical Formula 1 and a structural unit represented by Chemical Formula 2, and a solvent,"

The...