US Patent Issued to SAMSUNG ELECTRONICS on Sept. 8 for "Substrate processing apparatus for processing a substrate in one process chamber" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,730,387, issued on Sept. 8, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Substrate processing apparatus for processing a substrate in one process chamber" was invented by Young Ho Hwang (Suwon-si, South Korea), Jae Hong Lim (Suwon-si, South Korea), Chul Min Cho (Suwon-si, South Korea), Sang Hyun Lim (Suwon-si, South Korea), Young Kyun Im (Suwon-si, South Korea) and Seok Heo (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a process chamber having a space in which a substrate is disposed and processed in the process chamber, a supporter disposed in the process chambe...