ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,730,380, issued on Sept. 8, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Method of controlling semiconductor process and semiconductor processing apparatus" was invented by Jeongjin Lee (Suwon-si, South Korea), Doogyu Lee (Suwon-si, South Korea), Seungyoon Lee (Suwon-si, South Korea) and Chan Hwang (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of controlling semiconductor process includes forming a plurality of sample overlay keys by irradiating a first dose of extreme ultraviolet (EUV) light to a first photoresist layer formed on at least one sample wafer; determining a sample correction parame...