ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,730,382, issued on Sept. 8, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).
"Method of configuring extreme ultra-violet (EUV) illumination system, and EUV exposure method using the EUV illumination system" was invented by Yeongchan Cho (Suwon-si, South Korea), Minjae Kim (Suwon-si, South Korea), Sungmin Nam (Suwon-si, South Korea) and Seunghune Yang (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a method of configuring an optimized extreme ultraviolet (EUV) illumination system, and an EUV exposure method using the EUV illumination system. The method of configuring the EUV illumination system incl...