US Patent Issued to SAMSUNG ELECTRONICS on Sept. 29 for "Focused ion beam apparatus and control method thereof" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,749,647, issued on Sept. 29, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea).

"Focused ion beam apparatus and control method thereof" was invented by Yeoseon Choi (Suwon-si, South Korea) and Donghoon Kwon (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A focused ion beam apparatus may include an ion beam emitter for emitting an ion beam, a focused ion beam chamber into which ion gas may be introduced, a sample stage in the focused ion beam chamber to support a wafer sample, and an air bag in the focused ion beam chamber. The airbag may be positioned to not interfere with the sample stage."

The patent was f...