ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,723,873, issued on Sept. 1, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea).
"Overlay measuring method and system, and method of manufacturing a semiconductor device using the same" was invented by Inho Kwak (Suwon-si, South Korea), Jinsun Kim (Suwon-si, South Korea), Moosong Lee (Suwon-si, South Korea), Seungyoon Lee (Suwon-si, South Korea), Jeongjin Lee (Suwon-si, South Korea), Chan Hwang (Suwon-si, South Korea), Dohyeon Park (Suwon-si, South Korea) and Yeeun Han (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "In an overlay measurement method, an overlay mark having programmed overlay values is provided. T...