US Patent Issued to SAMSUNG ELECTRONICS on Oct. 27 for "Polymer, resist composition including the same, and method of forming pattern using the resist composition" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,774,354, issued on Oct. 27, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea).

"Polymer, resist composition including the same, and method of forming pattern using the resist composition" was invented by Minsang Kim (Suwon-si, South Korea), Haengdeog Koh (Suwon-si, South Korea), Yoonhyun Kwak (Suwon-si, South Korea), Beomseok Kim (Suwon-si, South Korea), Chanjae Ahn (Suwon-si, South Korea), Jungha Chae (Suwon-si, South Korea) and Sungwon Choi (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a polymer, a resist composition including the same, and a method of forming a pattern using the resist compos...