US Patent Issued to SAMSUNG ELECTRONICS on May 12 for "Substrate cleaning device and substrate cleaning method" (South Korean Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,623,255, issued on May 12, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea).

"Substrate cleaning device and substrate cleaning method" was invented by Donghoon Kwon (Suwon-si, South Korea), Juhyun Lee (Suwon-si, South Korea) and Chungki Min (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate cleaning apparatus may include a first roll member and a second roll member including a copolymer of a first water-soluble polymer and a second water-soluble polymer. The first roll member may include a first roll body extending in a first direction and first protrusions on a surface of the first roll body. The sec...