US Patent Issued to SAMSUNG ELECTRONICS on May 12 for "Methods and system of enhanced near-infrared light absorption of imaging systems using metasurfaces and nanostructures" (California, Massachusetts Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,628,463, issued on May 12, was assigned to SAMSUNG ELECTRONICS Co. LTD. (South Korea).

"Methods and system of enhanced near-infrared light absorption of imaging systems using metasurfaces and nanostructures" was invented by Radwanul Hasan Siddique (Monrovia, Calif.), Yibing Michelle Wang (Temple City, Calif.) and Mahdad Mansouree (Amherst, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A pixel for an imaging sensor is disclosed that includes a photodetector and a metasurface. The photodetector includes a first surface and sidewalls that extend into the photodetector in a first direction from the first surface. The metasurface is formed on the first...