ALEXANDRIA, Va., May 12 -- United States Patent no. 12,625,436, issued on May 12, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Lithography apparatus" was invented by Sung Yong Bae (Suwon-si, South Korea), Hyeon Jin Kim (Suwon-si, South Korea), Jeong-Gil Kim (Suwon-si, South Korea), Kyoung Hwan Oh (Suwon-si, South Korea) and Dong Jin Lee (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A lithography apparatus comprises a wafer stage, a cable configured to be bent as the wafer stage moves, a first support configured to prevent the cable from sagging, and to support the cable to maintain a bent state of the cable when the cable moves, a first rail installed on a fi...