US Patent Issued to SAMSUNG ELECTRONICS on March 24 for "Overlay correction method, and exposure method and semiconductor device manufacturing method including overlay correction method" (South Korean Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,585,199, issued on March 24, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea).

"Overlay correction method, and exposure method and semiconductor device manufacturing method including overlay correction method" was invented by Wooyong Jung (Suwon-si, South Korea), Dohun Kim (Suwon-si, South Korea), Joonhyun Kim (Suwon-si, South Korea), Jeongjin Lee (Suwon-si, South Korea), Seungyoon Lee (Suwon-si, South Korea) and Chan Hwang (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are an overlay correction method for effectively correcting an overlay due to degradation of a wafer table, and an exposure method...