ALEXANDRIA, Va., March 17 -- United States Patent no. 12,578,573, issued on March 17, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-Si, South Korea).
"System and method designing metalens" was invented by Ho Young Ahn (Suwon-si, South Korea), Hyeon Soo Park (Suwon-si, South Korea), Seong Woon Booh (Suwon-si, South Korea), Kyu Il Lee (Incheon, South Korea), Mun Bo Shim (Yongin-si, South Korea) and Seung Hoon Han (Seoul, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A system and method designing a metalens including nanostructures and a spacer layer between the nanostructures. The method includes; selecting a design area in relation to a width of the nanostructure and a pitch of the nanostru...