US Patent Issued to SAMSUNG ELECTRONICS on June 30 for "Image-based semiconductor device patterning method using deep neural network" (South Korean Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,672,494, issued on June 30, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Image-based semiconductor device patterning method using deep neural network" was invented by Jaewon Yang (Suwon-si, South Korea), Seongjin Park (Suwon-si, South Korea), Sangchul Yeo (Gwangsan-gu, South Korea), Seonmin Rhee (Seoul, South Korea), Hyeok Lee (Suwon-si, South Korea), Sooryong Lee (Seoul, South Korea) and Seungju Han (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device patterning method includes generating an input image by imaging information about a pattern of a sample, acquiring an output image of the pat...