ALEXANDRIA, Va., July 15 -- United States Patent no. 12,666,954, issued on June 23, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Semiconductor device including variable resistance pattern and electronic system including the semiconductor device" was invented by Hyunmog Park (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device is provided. The semiconductor device includes: gate lines spaced apart from each other between a conductive layer and a conductive pad; and a channel structure extending through the gate lines. The channel structure includes: a channel region which defines a columnar space, and includes a first channel end in contact wit...