ALEXANDRIA, Va., July 7 -- United States Patent no. 12,675,872, issued on July 7, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea).
"Method of inspecting defects" was invented by Bumjoo Lee (Suwon-si, South Korea), Jinwoo Lee (Suwon-si, South Korea) and Suyoung Lee (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A defect inspection method includes: recognizing image peaks that are reference positions of image patterns included an inspection image; performing filtering on a reference image including reference patterns, recognizing reference peaks, and then selecting some of the reference peaks as peak samples; calculating candidate correction constants by overlappi...