US Patent Issued to SAMSUNG ELECTRONICS on July 21 for "Optical proximity correction method, mask manufacturing method, semiconductor chip manufacturing method using the same and computing device" (South Korean Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,787, issued on July 21, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).

"Optical proximity correction method, mask manufacturing method, semiconductor chip manufacturing method using the same and computing device" was invented by Arin Lee (Suwon-si, South Korea), Kiho Yang (Seongnam-si, South Korea), Jeeeun Jung (Yongin-si, South Korea), Sungyong Moon (Seoul, South Korea) and Junyoung Jang (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An optical proximity correction (OPC) method for manufacturing a semiconductor chip including detecting edges of an initial layout pattern and determining an edge violating...