ALEXANDRIA, Va., July 21 -- United States Patent no. 12,688,342, issued on July 21, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-Si, South Korea).
"Device and method for improving simulator parameter" was invented by Chang Hwi Park (Seoul, South Korea), Chang Wook Jeong (Hwaseong-si, South Korea) and Moon Hyun Cha (Yongin-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A device for optimizing and/or improving a simulator parameter of a semiconductor device is provided. The device comprises a memory configured to store an evolution pool, and an input tensor-score pair, and a processor configured to sample a generator network in the evolution pool, initiate a critic network to train the s...