US Patent Issued to SAMSUNG ELECTRONICS on July 21 for "Cleaner for chemical mechanical polishing apparatus" (South Korean Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,686,100, issued on July 21, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Cleaner for chemical mechanical polishing apparatus" was invented by Jubong Lee (Suwon-si, South Korea), Jongsu Kim (Suwon-si, South Korea), Sungyong Park (Suwon-si, South Korea), Bongki Park (Suwon-si, South Korea), Eunsun Park (Suwon-si, South Korea), Hyunjoon Park (Suwon-si, South Korea) and Hoseop Choi (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A cleaner for a CMP apparatus includes a cleaning body, a plurality of cleaning nozzles, a vision system and a controller. The cleaning body may be arranged under a polishing head of t...