US Patent Issued to SAMSUNG ELECTRONICS on July 21 for "Brush polymer, photoresist composition including the same, and method of manufacturing integrated circuit device" (South Korean Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,781, issued on July 21, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Brush polymer, photoresist composition including the same, and method of manufacturing integrated circuit device" was invented by Jinjoo Kim (Seoul, South Korea), Sumin Kim (Suwon-si, South Korea), Hyunwoo Kim (Seongnam-si, South Korea), Yechan Kim (Hwaseong-si, South Korea), Juyoung Kim (Hwaseong-si, South Korea), Jicheol Park (Anyang-si, South Korea), Giyoung Song (Hwaseong-si, South Korea) and Suk Koo Hong (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A brush polymer for a photoresist, a photoresist composition, and a method of m...