US Patent Issued to SAMSUNG ELECTRONICS on July 14 for "Corner rounding method of OPC pattern based on deep learning, and OPC method and mask manufacturing method including the corner rounding method" (South Korean Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,379, issued on July 14, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).

"Corner rounding method of OPC pattern based on deep learning, and OPC method and mask manufacturing method including the corner rounding method" was invented by Kyungsoo Kim (Hwaseong-si, South Korea), Sooryong Lee (Seoul, South Korea), Jaewon Yang (Suwon-si, South Korea), Sangchul Yeo (Osan-si, South Korea) and Hyeok Lee (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The inventive concept provides a corner rounding method of a deep learning-based optical proximity correction (OPC) pattern by which patterning reliability may be ensur...