US Patent Issued to SAMSUNG ELECTRONICS on Feb. 24 for "Method of training semiconductor process image generator" (South Korean Inventors)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,561,958, issued on Feb. 24, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).

"Method of training semiconductor process image generator" was invented by Sangchul Yeo (Osan-si, South Korea), Jaewon Yang (Suwon-si, South Korea), Hyeok Lee (Suwon-si, South Korea) and Sooryong Lee (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of training a semiconductor process image generator includes training the semiconductor process image generator with a plurality of mask images including a first group and a second group, training the semiconductor process image generator with the second group and a first transformed gr...