US Patent Issued to SAMSUNG ELECTRONICS on Feb. 24 for "Machine learning (ML)-based process proximity correction (PPC) method and semiconductor device manufacturing method including the same" (South Korean Inventors)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,560,904, issued on Feb. 24, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Machine learning (ML)-based process proximity correction (PPC) method and semiconductor device manufacturing method including the same" was invented by Sooyong Lee (Suwon-si, South Korea) and Jeeyong Lee (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A machine learning (ML)-based process proximity correction (PPC) method includes receiving a first layout of an after clean inspection (ACI) including patterns for manufacturing a semiconductor device, extracting features of a first pattern from the first layout, generating a prediction ...