US Patent Issued to SAMSUNG ELECTRONICS on Feb. 24 for "Apparatus for monitoring a plasma process" (South Korean Inventors)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,562,357, issued on Feb. 24, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Apparatus for monitoring a plasma process" was invented by Meehyun Lim (Suwon-si, South Korea), Sungyeol Kim (Suwon-si, South Korea), Taekjin Kim (Suwon-si, South Korea), Minsung Kim (Suwon-si, South Korea) and Hosun Yoo (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus for monitoring a plasma process may include an electro-optical (EO) sensor module and an optical guide, the EO sensor module may be arranged in a plasma chamber configured to perform a semiconductor process for processing a substrate using plasma, the EO sen...