US Patent Issued to SAMSUNG ELECTRONICS on Aug. 25 for "Method of correcting overlay, method of controlling semiconductor process, and semiconductor processing apparatus" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,717,247, issued on Aug. 25, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Method of correcting overlay, method of controlling semiconductor process, and semiconductor processing apparatus" was invented by Jeongjin Lee (Suwon-si, South Korea) and Inbeom Yim (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of correcting overlay includes forming first patterns in a plurality of first shot areas by radiating extreme ultraviolet light reflected from a first mask to a first layer; forming second patterns in each of a plurality of second shot areas by radiating extreme ultraviolet light reflected from a se...