ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,712,156, issued on Aug. 18, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).
"Substrate processing apparatus" was invented by Jungmin Ko (Suwon-si, South Korea), Sangki Nam (Suwon-si, South Korea), Dougyong Sung (Suwon-si, South Korea), Byeongsang Kim (Suwon-si, South Korea), Yunhwan Kim (Suwon-si, South Korea), Suyoung Yoo (Suwon-si, South Korea), Namkyun Kim (Suwon-si, South Korea) and Kuihyun Yoon (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a process chamber having an internal space; upper and lower electrode portions facing each other in the internal space; and ...