US Patent Issued to SAMSUNG ELECTRONICS on Aug. 18 for "Photomask including line pattern monitoring mark and method of manufacturing integrated circuit device using the same" (South Korean Inventor)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,710,693, issued on Aug. 18, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).

"Photomask including line pattern monitoring mark and method of manufacturing integrated circuit device using the same" was invented by Byungje Jung (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photomask includes at least one line pattern monitoring mark having unit blocks that include design line patterns. Each of the unit blocks includes three design line patterns sequentially offset in a second direction perpendicular to the first direction, the unit blocks include a first unit block and a second unit block adjacent to the firs...