ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,706,274, issued on Aug. 11, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Plasma etching apparatus and semiconductor processing system" was invented by Dougyong Sung (Seoul, South Korea), Youngdo Kim (Hwaseong-si, South Korea), Byeongsang Kim (Hwaseong-si, South Korea), Yunhwan Kim (Hwaseong-si, South Korea), Jungmo Yang (Pyeongtaek-si, South Korea), Sejin Oh (Hwaseong-si, South Korea) and Sungho Jang (Hwaseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma etching apparatus includes a housing having a processing space; a support inside the housing, the support configured to support a substrate and inclu...